The FirstNano EasyTube 101 CVD system is used for the growth of carbon nanotubes (CNTs). The system can grow areas up to 25 mm × 75 mm using an iron catalyst deposited by the Fredrick electron beam ...

making it suitable for heat-sensitive substrates in CMOS fabrication. Additionally, PECVD can enhance the deposition rate and modify the film properties by controlling the plasma parameters. In this ...

Electron beam deposition occurs at high vacuum (10-7 Torr). A focused beam of high-energy electrons is directed to a crucible containing the ultra-high purity source material (such as gold). The beam ...

the FlexAL atomic layer deposition (ALD) system provides a wide range of optimized high-quality plasma ALD and thermal ALD procedures. The ALD product line includes a variety of instruments to satisfy ...

The tool has achieved process qualification at a mainland China semiconductor customer, and is now entering mass production. ACM also announced that its Ultra Fn A Thermal Atomic Layer Deposition ...

The Global Market for Electron Beam Physical Vapor Deposition (EB-PVD) Coating has demonstrated a strong growth trajectory, with its valuation standing at $1.8 billion in 2019. Projected to ascend to ...

ACM also announced that its Ultra Fn A Thermal Atomic Layer Deposition (Thermal ALD) Furnace tool, introduced in 2022, has successfully completed process qualification with another leading ...